原位构筑双S-Scheme NiO/Fe2O3/g-C3N4异质结协同可见光-Fenton催化降解土霉素In situ construction of double S-Scheme NiO/Fe2O3/g-C3N4 heterojunction in collaboration with Photo-Fenton catalytic degradation of oxytetracycline
毛娜,马欣玥,唐嘉璇
摘要(Abstract):
针对g-C_3N_4对可见光响应效率低和光生电子-空穴分离效率较低的问题,提出将半导体负载到g-C_3N_4表面的方法,可以提升g-C_3N_4在光催化降解有机污染物中的应用。文中采用浸渍法合成了三元复合材料NiO/Fe_2O_3/g-C_3N_4,对复合材料进行X射线衍射(XRD)、傅里叶变换红外光谱(FT-IR)、荧光光谱(PL)等表征,研究NiO/Fe_2O_3/g-C_3N_4复合材料对土霉素(OTC)光催化降解的性能。研究结果表明,在可见光-类Fenton体系中,OTC的降解率达89.1%。在添加空穴捕获剂三乙醇胺后,OTC溶液的降解效率由89.1%下降至42.1%,空穴(h~+)、超氧自由基(·O_2~-)和羟基自由基(·OH)是OTC降解过程的主要影响因素。复合材料具有良好的光催化性能是因为Fe_2O_3与NiO半导体和g-C_3N_4形成双S-Scheme异质结可以有效地将电子和空穴分离,抑制电子空穴复合。研究结论为异质结催化剂协同光-Fenton在污水处理中的应用提供参考。
关键词(KeyWords): 光催化降解;双S-Scheme;NiO/Fe_2O_3/g-C_3N_4复合材料;异质结;可见光-Fenton体系;土霉素
基金项目(Foundation): 陕西省教育厅重点实验室(20JS046);; 渭南市科技局(2021ZDYF-JCYJ-282)
作者(Author): 毛娜,马欣玥,唐嘉璇
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