李想^1,2,张林¹,杨波²,吴雅琴²

• 1:浙江大学 化学工程与生物工程学院，浙江 杭州 310027
• 2:杭州水处理技术研究开发中心有限公司，浙江 杭州 310012

摘要(Abstract)：

为了提高二氧化钛（TiO₂）薄膜光电性能，采用电化学氟化制备氟化二氧化钛薄膜（F-TiO₂），优化电压、时间、氟离子浓度对F-TiO₂光电性能的影响，考察F-TiO₂薄膜光电催化As（III）和苯酚的性能，并测试F-TiO₂薄膜光吸收性质，F-TiO₂在400℃焙烧后光电流以及TiO₂薄膜电极在含氟水溶液中光电流，分析F-TiO₂光电催化性能提高的原因。结果表明：最佳氟化条件为10 V、5 min、0.5% NaF；在0.8 V，N₂条件下，F-TiO₂稳态光电流提高约2.6倍；在0.8 V，空气条件下，光电催化As（III）和苯酚速率提高2.0倍左右。电化学表面氟化形成化学键氟可能是提高TiO₂光电催化性能的主要因素。

关键词(KeyWords)： 氟化TiO₂;薄膜电极;光电催化性能;As(III)氧化;苯酚降解

Abstract:

Keywords:

基金项目(Foundation): 国家重点研发计划（2017YFC0403701）；浙江省海水淡化技术研究重点实验室（2012E10001）；杭州市重大科技创新（20182013A02）。

作者(Author): 李想^1,2,张林¹,杨波²,吴雅琴²

DOI: 10.3969/j.issn.1003-9015.2020.03.020

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